Beckmann, C.Zhang, KunHofsäss, HansBrüsewitz, C.Vetter, U.Bharuth-Ram, Krish2016-10-142016-10-142015Beckman, et al. 2015. Mössbauer spectroscopy study of surfactant sputtering induced Fesilicide formation on a Si surface. Applied Surface Science. 357: 493-4970169-4332http://hdl.handle.net/10321/1661The formation of Fe silicides in surface ripple patterns, generated by erosion of a Si surface with keV Ar and Xe ions and simultaneous co-deposition of Fe, was investigated with conversion electron Mössbauer spectroscopy, atomic force microscopy and Rutherford backscattering spectrometry. For the dot and rip-ple patterns studied, we find an average Fe concentration in the irradiated layer between 6 and 25 at.%. The Mössbauer spectra clearly show evidence of the formation of Fe disilicides with Fe content close to 33 at.%, but very little evidence of the formation of metallic Fe particles. The results support the process of ion-induced phase separation toward an amorphous Fe disilicide phase as pattern generation mecha-nism. The observed amorphous phase is in agreement with thermodynamic calculations of amorphous Fe silicides.5 penArticlehttps://doi.org/10.1016/j.apsusc.2015.09.057